English
Arabic
Chinese (Simplified)
Dutch
Esperanto
French
German
Greek
Italian
Japanese
Korean
Portuguese
Russian
Spanish
UrduIn a new Q&A, microelectronics expert and CHiPPS Director Ricardo Ruiz shares his perspective on keeping pace with Moore’s Law in the decades to come through a revolutionary technique called extreme ultraviolet lithography.
Tag: Moore’s law, semiconductors, transistors
New Ultrathin Capacitor Could Enable Energy-Efficient Microchips
Scientists at Berkeley Lab and UC Berkeley have developed a thin film from a century-old material for next-gen memory and logic devices. The breakthrough advances the pursuit of low-voltage electronics that require less energy to operate than today’s silicon-based electronics.
Pushing the Boundaries of Moore’s Law: How Can Extreme UV Light Produce Tiny Microchips?
Some analysts say that the end of Moore’s Law is near, but Patrick Naulleau, the director of Berkeley Lab’s Center for X-Ray Optics (CXRO), says that it could be decades before the modern chip runs out of room for improvement, thanks to advances in materials and instrumentation enabled by the CXRO.
Next-Gen Semiconductor Manufacturing Tech Wins DOE National Pitch Competition
A process for making hybrid organic-inorganic materials (photoresists) sensitive to extreme-ultraviolet (EUV) light is one of two technologies that won the 2021 National Labs Accelerator Pitch Event. This technology—developed at the Center for Functional Nanomaterials (CFN), a U.S. Department of Energy (DOE) Office of Science User Facility at Brookhaven National Laboratory—could be used for next-generation semiconductor manufacturing by EUV lithography.
Scientists Dive Deep Into Hidden World of Quantum States
A research team led by the Department of Energy’s Lawrence Berkeley National Laboratory (Berkeley Lab) has developed a technique that could lead to new electronic materials that surpass the limitations imposed by Moore’s Law.