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UrduIn a new Q&A, microelectronics expert and CHiPPS Director Ricardo Ruiz shares his perspective on keeping pace with Moore’s Law in the decades to come through a revolutionary technique called extreme ultraviolet lithography.
Tag: photoresist
Pushing the Boundaries of Moore’s Law: How Can Extreme UV Light Produce Tiny Microchips?
Some analysts say that the end of Moore’s Law is near, but Patrick Naulleau, the director of Berkeley Lab’s Center for X-Ray Optics (CXRO), says that it could be decades before the modern chip runs out of room for improvement, thanks to advances in materials and instrumentation enabled by the CXRO.
Brookhaven Lab’s Chang-Yong Nam Named a Battelle ‘Inventor of the Year’
Materials scientist Chang-Yong Nam of the Center for Functional Nanomaterials (CFN)—a U.S. Department of Energy (DOE) Office of Science User Facility at DOE’s Brookhaven National Laboratory—has been recognized as an “Inventor of the Year” by the global science and technology organization Battelle.