How Scientists Are Accelerating Next-Gen Microelectronics

In a new Q&A, microelectronics expert and CHiPPS Director Ricardo Ruiz shares his perspective on keeping pace with Moore’s Law in the decades to come through a revolutionary technique called extreme ultraviolet lithography.

Next-Gen Semiconductor Manufacturing Tech Wins DOE National Pitch Competition

A process for making hybrid organic-inorganic materials (photoresists) sensitive to extreme-ultraviolet (EUV) light is one of two technologies that won the 2021 National Labs Accelerator Pitch Event. This technology—developed at the Center for Functional Nanomaterials (CFN), a U.S. Department of Energy (DOE) Office of Science User Facility at Brookhaven National Laboratory—could be used for next-generation semiconductor manufacturing by EUV lithography.

Scientists Dive Deep Into Hidden World of Quantum States

A research team led by the Department of Energy’s Lawrence Berkeley National Laboratory (Berkeley Lab) has developed a technique that could lead to new electronic materials that surpass the limitations imposed by Moore’s Law.

Science Snapshots from Berkeley Lab: 3D nanoparticles and magnetic spin

Researchers at Berkeley Lab have captured 3D images of nanoparticles in liquid with atomic precision, and developed an ultrathin electrical switch that could further miniaturize computing devices and personal electronics without loss of performance.