English
Arabic
Chinese (Simplified)
Dutch
Esperanto
French
German
Greek
Italian
Japanese
Korean
Portuguese
Russian
Spanish
UrduIn a new Q&A, microelectronics expert and CHiPPS Director Ricardo Ruiz shares his perspective on keeping pace with Moore’s Law in the decades to come through a revolutionary technique called extreme ultraviolet lithography.
Tag: EUV lithography
Department of Energy Announces $28.5 Million for LaserNetUS
Today, the Department of Energy’s Office of Science announced $28.5 million for LaserNetUS to advance discovery science and inertial fusion energy.
Pushing the Boundaries of Moore’s Law: How Can Extreme UV Light Produce Tiny Microchips?
Some analysts say that the end of Moore’s Law is near, but Patrick Naulleau, the director of Berkeley Lab’s Center for X-Ray Optics (CXRO), says that it could be decades before the modern chip runs out of room for improvement, thanks to advances in materials and instrumentation enabled by the CXRO.