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UrduApplying his passions for science and art, Nikhil Tiwale—a postdoc at Brookhaven Lab’s Center for Functional Nanomaterials—is fabricating new microelectronics components.
Tag: atomic layer deposition
Brookhaven’s Ivan Bozovic Wins 2021 James C. McGroddy Prize for New Materials
The American Physical Society has selected physicist Ivan Bozovic of the U.S. Department of Energy’s Brookhaven National Laboratory as a co-recipient of the 2021 James C. McGroddy Prize for New Materials. Bozovic and his collaborators were recognized “For pioneering the atomic-layer-by-layer synthesis of new metastable complex-oxide materials, and the discovery of resulting novel phenomena.”
Matt Law: Then and Now / 2010 Early Career Award Winner
Then and Now looks at what a 2010 Department of Energy Office of Science Early Career Award meant for Matt Law, now an associate professor in the Department of Chemistry at the University of California, Irvine.
New atomic layer deposition process invented by UAH researchers
A new way to deposit thin layers of atoms as a coating onto a substrate material at near room temperatures has been invented at The University of Alabama in Huntsville (UAH), a part of the University of Alabama System. Thin film deposition is used in microelectronics manufacturing.
Brookhaven and Forge Nano to Mature Noble Gas-Trapping Technology
Through DOE’s Technology Commercialization Fund, the national lab-startup team will develop “nanocages” for nuclear applications.
New Process For Preserving Lumber Could Offer Advantages Over Pressure Treating
Researchers have developed a new method that could one day replace conventional pressure treating as a way to make lumber not only fungal-resistant but also nearly impervious to water – and more thermally insulating.