English
Arabic
Chinese (Simplified)
Dutch
Esperanto
French
German
Greek
Italian
Japanese
Korean
Portuguese
Russian
Spanish
UrduWayne State University Professor Charles Winter, Ph.D. was awarded a three-year, $554,853 grant from the National Science Foundation to investigate new molecules and chemical reactions that can enable the growth of metal and metal-silicon thin films for advanced transistors, such as those used in tech devices like computers, phones and cars.
Tag: atomic layer deposition
Nikhil Tiwale: Practicing the Art of Nanofabrication
Applying his passions for science and art, Nikhil Tiwale—a postdoc at Brookhaven Lab’s Center for Functional Nanomaterials—is fabricating new microelectronics components.
Brookhaven’s Ivan Bozovic Wins 2021 James C. McGroddy Prize for New Materials
The American Physical Society has selected physicist Ivan Bozovic of the U.S. Department of Energy’s Brookhaven National Laboratory as a co-recipient of the 2021 James C. McGroddy Prize for New Materials. Bozovic and his collaborators were recognized “For pioneering the atomic-layer-by-layer synthesis of new metastable complex-oxide materials, and the discovery of resulting novel phenomena.”
Matt Law: Then and Now / 2010 Early Career Award Winner
Then and Now looks at what a 2010 Department of Energy Office of Science Early Career Award meant for Matt Law, now an associate professor in the Department of Chemistry at the University of California, Irvine.
New atomic layer deposition process invented by UAH researchers
A new way to deposit thin layers of atoms as a coating onto a substrate material at near room temperatures has been invented at The University of Alabama in Huntsville (UAH), a part of the University of Alabama System. Thin film deposition is used in microelectronics manufacturing.
Brookhaven and Forge Nano to Mature Noble Gas-Trapping Technology
Through DOE’s Technology Commercialization Fund, the national lab-startup team will develop “nanocages” for nuclear applications.
New Process For Preserving Lumber Could Offer Advantages Over Pressure Treating
Researchers have developed a new method that could one day replace conventional pressure treating as a way to make lumber not only fungal-resistant but also nearly impervious to water – and more thermally insulating.