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Next-Gen Semiconductor Manufacturing Tech Wins DOE National Pitch Competition

November 1, 2021 sarah JonasAnnouncement

A process for making hybrid organic-inorganic materials (photoresists) sensitive to extreme-ultraviolet (EUV) light is one of two technologies that won the 2021 National Labs Accelerator Pitch Event. This technology—developed at the Center for Functional Nanomaterials (CFN), a U.S. Department of Energy (DOE) Office of Science User Facility at Brookhaven National Laboratory—could be used for next-generation semiconductor manufacturing by EUV lithography.